PADT Receives US Patent for Support Cleaning Apparatus System

Published by , October 5, 2018 12:42 pm

( PADT announced that it has been awarded a U.S. patent for its Support Cleaning Apparatus (SCA) system invented by Rey Chu, Solomon Pena and Mark C. Johnson. The patent protects the intellectual property applied by PADT to achieve its industry-leading performance and reliability goals of soluble support removal. Critical information in the patent includes how the SCA system is laid out and has different sections, each with a purpose for achieving the intended results. It also identifies the geometry and orientation of the system that forces the water to move in a specific pattern that cleans the parts more efficiently.
PADT’s SCA systems are currently sold exclusively by Stratasys, Ltd. (SSYS) for use with any of the Stratasys printers that use the Soluble Support Technology (SST) material. Known for its innovation in the industry, this award marks PADT’s 4th patent to-date.

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